Publications

Wasa, A., J. Aitken, H. Jun, C. Bishop, S. Krumdieck, J.A. Heinemann, Copper and Nanostructured Anatase Rutile and Carbon coatings induce adaptive antibiotic resistance, Applied Microbiology and Biotechnology, (2022) 117

Huang, Y., S. L. Masters, S.P. Krumdieck, Phase field model of faceted anatase TiO2 dendrites in low pressure chemical vapor deposition, Applied Physics Letters, 119 (2021) 221602.

Wasa, A., J. G. Land, R. Gorthy, S. Krumdieck, C. Bishop, W. Godsoe, J. A. Heinemann, Antimicrobial and biofilm-disrupting nanostructured TiO2 coating demonstrating photoactivity and dark activity, FEMS Microbiology Letters, Vol. 368:7 (2021) fnab039

Gorthy, R., A. Wasa, J. G. Land, Z Yang, J.A. Heinemann, C.M. Bishop, S.P. Krumdieck, Effects of post-deposition heat treatment on nanostructured TiO2-C composite structure and antimicrobial properties, Surface & Coatings Technology, 409 (2021) 126857

Huang Y., Masters S.L., Krumdieck S.P., Bishop C.M., The role of faceting in biaxially textured thin films: columnar morphology and abnormal tilting. Journal of Applied Physics, 128 (2020) 055303.  

Gorthy, R., S. Krumdieck, C. Bishop, Process-induced nanostructures on anatase single crystals via pulsed-pressure MOCVD, Materials, 13(7), (2020) 1668. https://doi.org/10.3390/ma13071668 (open access)  

Krumdieck, S. P., R. Boichot, R. Gorthy, J. G. Land, S. Lay, A. J. Gardecka, M. I. J. Polson, A. Wasa, J. E. Aitken, J. A. Heinemann, G. Renou, G. Berthomé, F. Charlot, T. Encinas, M. Braccini, C. M. Bishop, Nano-structured Nanostructured TiO2 anatase-rutile-carbon solid coating with visible light antimicrobial activity, Nature Scientific Reports, 9, (2019) 1883. https://www.nature.com/articles/s41598-018-38291-y  (open access)

Gardecka, A. J., M.I.J. Polson, S.P. Krumdieck, Y. Huang, C.M. Bishop, Growth stages of nano-structured mixed-phase titania thin films and effect on photocatalytic activity, Thin Solid Films, 685 (2019) 136-144. https://doi.org/10.1016/j.tsf.2019.06.018

Aleksandra J. Gardecka, Catherine Bishop, Darryl Lee, Ivan P. Parkin, Andreas Kafizas and Susan Krumdieck, High efficiency water splitting photoanodes composed of nano-structured anatase-rutile TiO2 heterojunctions by pulsed-pressure MOCVD, Applied Catalysis B: Environmental, 224 (2018) 912-911. org/10.1016/j.apcatb.2017.11.033 

Krumdieck,S. R. Gorthy, G. Land, A. J. Gardecka, .M. I. J. Polson, R. Boichot, C. M. Bishop, J. V. Kennedy, Titania Solid Thin Films Deposited by pp-MOCVD Exhibiting Visible Light Photocatalytic Activity, Physica Status Solidi a, 1700578 (2017) 1-7. DOI:10.1002/pssa.201700578  

Susan Krumdieck, Rukmini Gorthy, Aleksandra J. Gardecka, Darryl Lee, Senzo Miya, Sam Davies Talwar, Matthew I. J. Polson, Catherine Bishop, Characterization of photocatalytic, wetting and optical properties of TiO2 thin films and demonstration of uniform coating on a 3-D surface in the mass transport controlled regime, Surface and Coatings Technology, Vol 326 Part B (2017) 402-410. https://doi.org/10.1016/j.surfcoat.2016.11.064

Boichot, R., S. Krumdieck, Numerical modelling of the droplet vaporization for design and operation of liquid pulsed CVD, Chemical Vapor Deposition, 21 (2015) 1-10. https://doi.org/10.1002/cvde.201507191

Gunby, N.R., S. Krumdieck, H. Murthy, S. L. Masters, S. S. Miya, Study of precursor chemistry and solvent systems in pp-MOCVD processing with alumina case study, Physica Status Solidi a, 1Vol 212, No. 7 (2015), 1519-1526, DOI 10.1002/pssa.201532309.

Krumdieck, S., S. S. Miya, D. Lee, S. Davies-Talwar, C. M. Bishop, Titania-based photocatalytic coatings on stainless steel hospital fixtures, Physica Status Solidi C,12, No. 7 (2015), 1028-1035, DOI 10.1002/pssc.201510040.

Raj, R., S. Krumdieck, A Langmuir-kinetic model for CVD growth from chemical precursors, CVD, 19, (2013) 260-266.

Krumdieck, S., S. Davies Talwar, C Bishop, T. Kemmitt, J., Kennedy, Al2O3 coatings on stainless steel using pulsed-pressure MOCVD, Surface and Coatings Technology, Vol. 230 (2013) 208-212.

Lee, D., S. Davies Talwar, S. Krumdieck, Scale up design for industrial development of a PP-MOCVD coating system, Surface and Coating Technology, Vol. 230 (2013) 39-45.

Krumdieck, S., Conformality of ceramic oxygen barrier coatings on micro- and nanoscale features by Pulsed-Pressure MOCVD, Journal of the Australian Ceramic Society, Vol. 48, Issue 1 (2012) 69-79.

Krumdieck, S., B. P. Reyngoud, A.D. Barnett, D.J. Clearwater, R.M. Hartshorn, C.M. Bishop, B.P. Redwood, E.L. Palmer, Deposition of Bio-Integration Ceramic Hydroxyapatite by Pulsed-Pressure MOCVD using a single liquid precursor solution, Chemical Vapor Deposition 16 (2010) 55-63.

Siriwongrungson, V., S. Krumdieck, B.P. Reyngoud, A.D. Barnett, Bio-integration ceramics on 3D specimens by Pulsed-Pressure Metal-Organic CVD, Chemical Vapor Deposition 16 (2010) 15-18.

M. Cave, K.-C. Tseng, J.-S. Wu, M.C. Jermy, J.-C. Huang, S.P. Krumdieck, Implementation of Unsteady Sampling Procedures for the Parallel Direct Simulation Monte Carlo Method, Journal of Computational Physics, Vol 227, 12 (2008) 6249-6271.

Ramirez, L., M. Mecartney, S. Krumdieck, Nanocrystalline ZrO2 thin films on silicon fabricated by pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD), Journal of Materials Research, 23 (8) (2008) 2202-2211.

Lebedev, M. and S. Krumdieck, Optically transparent, dense a-Al2O3 thick films deposited on glass at room temperature, Current Applied Physics, Vol. 8, 3-4 (2008) 233-236.

Cave, Hadley M., Susan P. Krumdieck, and Mark C. Jermy, Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing, Chemical Engineering Journal, Vol 135, 1-2  (2008) 120-128.

Krumdieck, Susan P., Hadley M. Cave, Silviu Baluti, Mark Jermy, Ady Peled, Expansion transport regime in pulsed-pressure chemical vapor deposition, Chemical Engineering Science, 62 (2007) 6121-6128.

Krumdieck, S., A. Kristinsdottir, L. Ramirez, M. Lebedev, N. Long, Growth rate, microstructure and conformality as a function of vapor exposure for zirconia thin films by pulsed-pressure MOCVD, Surface & Coatings Technology, Vol 201, 22-23 (2007) 8908-8913.

Siriwongrungson, Vilailuck, Maan M. Alkaisi, Susan P. Krumdieck, Step coverage of thin titania films on patterned silicon substrate by Pulsed-Pressure MOCVD, Surface & Coatings Technology, Vol 201, 22-23, (2007) 8944-8949.

Hartshorn, R., S. Stockwell, M. Lebedev, S. Krumdieck, Precursor system for bio-integration ceramics and deposition onto tantala scaffold bone interface surfaces, Surface & Coatings Technology, Vol 201, 22-23, (2007) 9413-9416.

Krumdieck, S., O. Sbaizero, A. Bullert and R. Raj, YSZ layers by Pulsed-MOCVD on solid oxide fuel cell electrodes, Surface Coatings and Technology, 167 (2003) 226-233.

Krumdieck, S., O. Sbaizero, A. Bullert and R. Raj, Solid yttria-stabilized-zirconia films by pulsed chemical vapor deposition from metal-organic precursors, Journal of the American Ceramic Society, 85[11] (2002) 2873-75.

Krumdieck, S., Kinetic Model of Low Pressure Film Deposition from Single Precursor Vapor in a Well-Mixed, Cold-Wall Reactor, Acta Materialia, 49 (2001) 583-588.

Krumdieck, S. and R. Raj, Experimental characterization and modeling of Pulsed-MOCVD utilizing ultrasonic atomization of liquid precursor, Chemical Vapor Deposition, 7 No. 2 (2001) 85-90.

Krumdieck, S. and R. Raj, Growth rate and morphology for ceramic films by pulsed-MOCVD, Surface Coatings and Technology, 141 (2001) 7-14.

Krumdieck, S, O. Sbaizero, and R. Raj, Unique Precursor Delivery and Control Afforded by Low-Pressure Pulsed-CVD Process with Ultrasonic Atomization, Journal de Physique IV, Edited by D. Davazoglou and C. Vahlas, EDP Sciences, France (2001) 1161-68.

Krumdieck, S. and R. Raj, On the conversion efficiency of alkoxide precursor into oxide films grown by ultrasonic assisted, pulsed liquid injection metalorganic chemical vapor deposition (Pulsed-MOCVD) process, Journal of the American Ceramic Society, 82[6] (1999) 1605-07.

Invited Chapter in Reference Book

Krumdieck, S., “Chapter 2.  CVD Reactors and Delivery Systems Technology”, In: Chemical Vapor Deposition: Precursors and Processes, Ed: A. Jones and M. L. Hitchman, Royal Society of Chemistry Publishing, Cambridge, UK, (2009) pp.37-92. http://dx.doi.org/10.1039/9781847558794-00037

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